Amsterdam photography museum FOAM will be closing its doors temporarily to ready Diane Arbus' large retrospective. In the meantime, the hospitable people at Museum Van Loon made space available for a Foam-initiated exhibition.
Dutch artist Daniëlle van Ark has been invited to be inspired by the house of the Van Loon family and showcase her works at the Van Loon house, characterized by an fascination for opulence, social status, identity, mortality and transiency. Recurring themes which play a big role in the house.
In this exhibition, Van Ark's works form a special relation to the museum's collection. Alongside a selection of Van Ark's previous photography work, the exhibit will also premier spatial installation works.
Daniëlle van Ark (1974) studied at the Royal Academy of Art in The Hague and lives and works in Amsterdam. She is resident of the Government Academy of Art 2012-2013. She received several nominations from numerous national institutions among which the Steenbergen Stipend, the Bouw in Beeld Prize and the 2011 National Portrait Prize.
She has made her international breakthrough with her series For Art's Sake, in which she registered on film class awareness and differences, and attitudes and of the New York and Chelsea art circles during openings in art galleries.
Foam in Van Loon III – Daniëlle van Ark will be opened by Philippa Van Loon Thursday October 11 between 17:30 – 20.00 and open for public October 12 2012 till January 21 2013.
Museum van Loon
Keizersgracht 672 (MAP)
020 624 5255